The influence of crystal orientation on surface passivation in multi-crystalline silicon
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Sio, Hang Cheong (Kelvin)
Phang, Sieu Pheng
Wan, Yimao
Liang, Wensheng
Trupke, T
Cao, Sheng
Hu, Dongli
Wan, Yuepeng
MacDonald, Daniel
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IEEE
Abstract
We present an approach to study the variation of the surface recombination velocity in multi-crystalline silicon wafers through photoluminescence imaging for thin, passivated and mirror polished wafers. The influence of crystal orientation on surface pass
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Conference Record of the IEEE Photovoltaic Specialists Conference
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2037-12-31