Study of Diffusivity and Electrical Properties of Zr and Hf in Silicon

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dc.contributor.authorVyvenko, O F
dc.contributor.authorSachdeva, R
dc.contributor.authorIstratov, A A
dc.contributor.authorArmitage, R
dc.contributor.authorWeber, E R
dc.contributor.authorDeenapanray, Prakash
dc.contributor.authorJagadish, Chennupati
dc.contributor.authorGao, Yue
dc.contributor.authorHuff, H R
dc.coverage.spatialPhiladelphia, Pennsylvania, USA
dc.date.accessioned2015-12-13T22:22:52Z
dc.date.available2015-12-13T22:22:52Z
dc.date.createdMar 22 2002
dc.date.issued2002
dc.date.updated2015-12-11T08:00:46Z
dc.identifier.isbn1-56677-373-3
dc.identifier.urihttp://hdl.handle.net/1885/72479
dc.publisherElectrochemical Society Inc
dc.relation.ispartofseriesSemiconductor Silicon 2002
dc.sourceProceedings of the Ninth International Symposium on Silicon Materials Science and Technology
dc.titleStudy of Diffusivity and Electrical Properties of Zr and Hf in Silicon
dc.typeConference paper
local.bibliographicCitation.lastpage451
local.bibliographicCitation.startpage440
local.contributor.affiliationVyvenko, O F, University of California
local.contributor.affiliationSachdeva, R, University of California
local.contributor.affiliationIstratov, A A, University of California
local.contributor.affiliationArmitage, R, University of California
local.contributor.affiliationWeber, E R, University of California
local.contributor.affiliationDeenapanray, Prakash, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationJagadish, Chennupati, College of Physical and Mathematical Sciences, ANU
local.contributor.affiliationGao, Yue, Electro Optic Systems Pty Ltd
local.contributor.affiliationHuff, H R, International SEMATECH, Inc.
local.contributor.authoruidDeenapanray, Prakash, u4018937
local.contributor.authoruidJagadish, Chennupati, u9212349
local.description.notesImported from ARIES
local.description.refereedYes
local.identifier.absfor091207 - Metals and Alloy Materials
local.identifier.ariespublicationMigratedxPub3269
local.type.statusPublished Version

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